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Proximity bias falloffs
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Documentation/montecarlo_layerSettings_biasEtch.html

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@@ -201,6 +201,28 @@ <h3 class="western">Bias and Etch Parameters</h3>
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<p class="western" style=" line-height: 100%">Falloffs are also available, which cause the contribution of side rays to be progressively reduced.</p>
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<img class="c" src="images/proxbias_noFalloff.png" alt=""/>
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<img class="c" src="images/proxbias_linearFalloff.png" alt=""/>
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<img class="c" src="images/proxbias_gaussianFalloff.png" alt=""/>
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<img class="c" src="images/proxbias_cosineFalloff.png" alt=""/>
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<p class="western" style=" line-height: 100%">Note that artifacts and asymmetry can arise from insufficient rays being used, as shown below. Work continues to improve the algorithm, but this is something to be aware of in the current approach.</p>
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